Aerosol ionizer

ABSTRACT

A system and method comprising an ion production chamber having a ultra-violet light source disposed towards said chamber, a harvest gas disposed to flow through the chamber from an inlet to an outlet, and a jet, said jet operable to introduce a sample into the harvest gas flow. In some embodiments the system includes using helium as the harvest gas. Certain embodiments include introducing a sample perpendicular to the harvest gas flow and using multiple sample introduction jets to increase mixing efficiency. The charge sample may be coupled to a MEMS-based electrometer.

PRIORITY

This continuation-in-part (CIP) application claims the benefit of U.S.provisional patent application No. 61/825,019 entitled “Charged ParticleDetector,” filed May 18, 2013, U.S. Pat. No. 9,018,598, filed May 16,2014 and co-pending U.S. patent application Ser. No. 14/666,673 filedMar. 24, 2015, and Ser. No. 14/280,582 filed May 17, 2014, all of whichare incorporated by reference as if fully set forth herein.

BACKGROUND

The phrase “Microelectromechanical systems” or MEMS generally describesthe technology of very small devices. Conventionally MEMS are made up ofcomponents between 1 to 100 micrometers in size (i.e. 0.001 to 0.1 mm),and more typically range in size from 20 micrometers (20 millionths of ameter) to a millimeter (i.e. 0.02 to 1.0 mm). They usually consist ofcomponents that interact with the environment such as microsensors. Atthese small sizes MEMS raise different technological challenges. Forexample, because of the large surface area to volume ratio of MEMS,surface effects such as electrostatics and wetting dominate over volumeeffects such as inertia or thermal mass.

MEMS became practical once they could be fabricated using modifiedsemiconductor device fabrication technologies, normally used to makeelectronics. These include molding and plating, wet etching (KOH, TMAH)and dry etching (RIE and DRIE), electro discharge machining (EDM), andother technologies capable of manufacturing small devices.

BRIEF DESCRIPTION OF THE DRAWINGS

FIG. 1 illustrates a design for a MEMS device according to certainaspects of the current disclosure.

FIG. 2 shows a representative schematic of control circuitry for use insome embodiments.

FIG. 3 shows certain elements that may form some embodiments of acharged particle detector.

FIG. 4 illustrates one embodiment of a system for a charged particledetector.

FIG. 5 illustrates a representation of a light-based ionizer 500.

SUMMARY

Disclosed herein is a system and method comprising an ion productionchamber having an ultra-violet (UV) energy source disposed towards saidchamber, a harvest gas disposed to flow through the chamber from aninlet to an outlet, and a jet, said jet operable to introduce a sampleinto the harvest gas flow. In some embodiments the system includes usinghelium as the harvest gas. Certain embodiments include introducing asample perpendicular to the harvest gas flow and using multiple sampleintroduction jets to increase mixing efficiency. The charge sample maybe coupled to a MEMS-based electrometer.

Also disclosed is a charged particle detection system for aerosolmeasurements. The system may include a scanning electrical mobilitysizer (SEMS), a conductive porous electrode, an electrometer based on acapacitive microelectromechanical system (MEMS), and signal processingelectronics. The electrometer may be coupled to a porous conductiveelectrode that traps the charged particles while allowing a continuousair flow. Charge is measured using a vibrating capacitance electrometercomposed of an electrostatic comb drive actuator and sense parallelplate capacitors. Particle concentrations can then be correlated to themeasured charge.

The MEMS electrometer relies on the concept of the vibrating reed whereone of the plates on a parallel plate capacitor is allowed to oscillateat a fixed frequency. The electrometer may consist of three parts:differential actuators, differential motion sensing, and chargemodulation parallel plate capacitors. A direct current (DC) chargecollected in the porous electrode may be modulated at the MEMSelectrometer drive frequency and, in some embodiments, at higherharmonics due to the nonlinear nature of parallel plate capacitors.Feed-through interference from drive signals to the sensed charge may bereduced by designing the charge capacitors and detection electronics tomeasure a signal at twice (or some other multiple) of the drivefrequency, where the feed-through signal is minimized.

DESCRIPTION Generality of Invention

This application should be read in the most general possible form. Thisincludes, without limitation, the following:

References to specific techniques include alternative and more generaltechniques, especially when discussing aspects of the invention, or howthe invention might be made or used.

References to “preferred” techniques generally mean that the inventorcontemplates using those techniques, and thinks they are best for theintended application. This does not exclude other techniques for theinvention, and does not mean that those techniques are necessarilyessential or would be preferred in all circumstances.

References to contemplated causes and effects for some implementationsdo not preclude other causes or effects that might occur in otherimplementations.

References to reasons for using particular techniques do not precludeother reasons or techniques, even if completely contrary, wherecircumstances would indicate that the stated reasons or techniques arenot as applicable.

Furthermore, the invention is in no way limited to the specifics of anyparticular embodiments and examples disclosed herein. Many othervariations are possible which remain within the content, scope andspirit of the invention, and these variations would become clear tothose skilled in the art after perusal of this application.

Specific examples of components and arrangements are described below tosimplify the present disclosure. These are, of course, merely examplesand are not intended to be limiting. In addition, the present disclosuremay repeat reference numerals and/or letters in the various examples.This repetition is for the purpose of simplicity and clarity and doesnot in itself dictate a relationship between the various embodimentsand/or configurations discussed.

Read this application with the following terms and phrases in their mostgeneral form. The general meaning of each of these terms or phrases isillustrative, not in any way limiting.

Lexicography

The term “Aerosols” generally refers to small liquid or solid particlesin a gas.

The terms “effect”, “with the effect of” (and similar terms and phrases)generally indicate any consequence, whether assured, probable, or merelypossible, of a stated arrangement, cause, method, or technique, withoutany implication that an effect or a connection between cause and effectare intentional or purposive.

The term “Electrometry” generally refers to a technique for measuringsmall electrical currents. Electrometer instruments are conventionallyused in tunneling microscopy, mass spectrometry, and surface chargeanalysis. Conventional electrometers may include single-electrontransistors, nano-mechanical resonators at cryogenic temperatures,graphene resonators, and units based on vibrating reed devices.

The term “Flexures” generally means a bendable material designed tosupport a structure, but allowing a predetermined amount of movement.

The term “relatively” (and similar terms and phrases) generallyindicates any relationship in which a comparison is possible, includingwithout limitation “relatively less”, “relatively more”, and the like.In the context of the invention, where a measure or value is indicatedto have a relationship “relatively”, that relationship need not beprecise, need not be well-defined, need not be by comparison with anyparticular or specific other measure or value. For example and withoutlimitation, in cases in which a measure or value is “relativelyincreased” or “relatively more”, that comparison need not be withrespect to any known measure or value, but might be with respect to ameasure or value held by that measurement or value at another place ortime.

The term “substantially” (and similar terms and phrases) generallyindicates any case or circumstance in which a determination, measure,value, or otherwise, is equal, equivalent, nearly equal, nearlyequivalent, or approximately, what the measure or value is recited. Theterms “substantially all” and “substantially none” (and similar termsand phrases) generally indicate any case or circumstance in which allbut a relatively minor amount or number (for “substantially all”) ornone but a relatively minor amount or number (for “substantially none”)have the stated property. The terms “substantial effect” (and similarterms and phrases) generally indicate any case or circumstance in whichan effect might be detected or determined.

The terms “this application”, “this description” (and similar terms andphrases) generally indicate any material shown or suggested by anyportions of this application, individually or collectively, and includeall reasonable conclusions that might be drawn by those skilled in theart when this application is reviewed, even if those conclusions wouldnot have been apparent at the time this application is originally filed.

The term “Stokes number” generally refers to a dimensionless numbercorresponding to the behavior of particles suspended in a fluid flow.The Stokes number conventionally represents the ratio of the inertialforce (proportional to the mass of the particle) to the viscous force(proportional to fluid viscosity).

The terms “Ultrafine particles” or “UFPs” generally refer to nanoscaleparticles that are less than 100 nanometers in diameter. UFPs includeboth manufactured and naturally occurring particles.

MEMS Electrometer

FIG. 1 illustrates a design for a MEMS device 100 according to certainaspects of the current disclosure. The device 100 includes a movingshuttle 110 supported by four flexures 112. Comb drive actuators 114 forpush-pull driving of the shuttle 110 are placed at both ends of theshuttle 110. The shuttle 110 includes parallel-plate electrodes 116disposed centrally to the shuttle 110. Interspersed between the parallelplate electrodes 116 are stationary electrodes 118 disposedindependently from the shuttle 110. Together the parallel plate andstationary electrodes form a measurement capacitor (Cv).

The comb drive actuators 114 utilize electrostatic forces that actbetween two electrically conductive combs. Comb drive actuatorsconventionally operate at the micro or nanometer scale and are generallymanufactured by bulk micromachining or surface micromachining a siliconwafer substrate. The attractive electrostatic forces are created when avoltage is applied between the stationary and moving combs causing themto be drawn together. The force developed by the actuator isproportional to the change in capacitance between the two combs. Thisforce may be increased by increasing the driving voltage, the number ofcomb teeth, and the gap between the teeth. The teeth of the comb driveactuators 114 are arranged so that they can slide past one another untileach tooth occupies the slot in the opposite comb. The flexures 112operate as restoring springs to center the shuttle 110 when the drivingvoltage is removed.

The MEMS device 100 may be fabricated in 15 micrometer thick epitaxialpolysilicon such as ST Microelectronic's ThELMA (Thick Epitaxial Layerfor Micro-actuators and Accelerometers) process and vacuum sealed at thechip level. While the inventors contemplate using a shuttle 110 of 1mm×1.2 mm, this should not be limiting because the shuttle 110 may beformed at any suitable size depending on the application.

Certain embodiments of device 110 may employ the electromechanicalcharacteristics shown in Table 1. The measured parameters of Table 1 arederived from predetermined operating frequencies.

TABLE 1 Parameter Value Units Spring-beam Length 428 μm Spring-beamWidth 2.4 μm Structural Layer Thickness 15 μm Spring Constant 1.59 N/mShuttle Mass 6.58 μg Resonance f_(n) 2.3 kHz Comb Drive Gap 2.6 μm No.Combs 96 dC/dx for Comb Drive 8.58 nF/m Sense Plate Gap 3.6 μm SensePlate Length 426 μm No. Sense Plates 66 Sense capacitance C_(V) 2.07468pF Normalized Displacement x₀ 0.17 μm/μm Quality Factor Q 180 ParasiticCapacitance C_(P) 20 pF DC Drive voltage 2 V AC Drive Voltage 200mV_(rms)

In operation, each moving parallel-plate electrode 116 faces twostationary electrically-connected electrodes 118. When the comb driveactuators 114 are driven at a first frequency, the shuttle 110 movescausing the parallel-plate electrodes to move closer to and further fromat least one of the stationary electrodes 118. The result is that thesense signal from the stationary electrodes 118 is twice the drivefrequency. This provides a benefit of separating the charge drive signalfrom the output signal allowing for easier measurement techniques.

To maximize the capacitance variation at a given excitation voltage,driving may occur at the structure's first in-plane natural frequency,which is ideally beyond the cutoff frequency of the detection circuitry.Operating the device as a resonant sensor ensures that the electrostaticforce is amplified by the mechanical quality factor Q and allows for thepossibility of operating the device as a closed-loop resonator.Close-loop may be accomplished by sensing the motion of the actuatorelectrostatically. The sensed motion may then be employed to track thefrequency of oscillation as well as the amplitude of motion. A bettercontrol on motion may provide for calibration of the electrometer toaccurately increase sensitivity.

One having skill in the art will recognize that minimizing parasiticcapacitance and maximizing the displacement between the stationary andmoving electrodes will increase device efficiency. Moreover devicemechanical architecture may include folded springs to get increasedbetter linearity for a larger driving signal and to shift the outputsignal to frequencies higher than 10 kHz. This operates to providebetter noise filtering characteristics.

Some embodiments of the MEMS device 100 may operate as a variablecapacitor because charge placed on either of the electrode interfereswith the resulting output frequency. Accordingly, detection electronicsoperating with the device 100 as a variable capacitor may sense charge(Qc) applied to the device 110 and provide a proportional output signal.The detection electronics may be designed to minimize systematic noisethus increasing overall performance.

References in the specification to “one embodiment”, “an embodiment”,“an example embodiment”, etc., indicate that the embodiment describedmay include a particular feature, structure or characteristic, but everyembodiment may not necessarily include the particular feature, structureor characteristic. Moreover, such phrases are not necessarily referringto the same embodiment. Further, when a particular feature, structure orcharacteristic is described in connection with an embodiment, it issubmitted that it is within the knowledge of one of ordinary skill inthe art to effect such feature, structure or characteristic inconnection with other embodiments whether or not explicitly described.Parts of the description are presented using terminology commonlyemployed by those of ordinary skill in the art to convey the substanceof their work to others of ordinary skill in the art.

FIG. 2 shows a representative schematic of control circuitry for use insome embodiments. In FIG. 2 the MEMS electrometer 210 operates as avariable capacitor altering the response of the amplifier AD8067 whencharge is applied to the MEMS electrometer. Certain embodiments maycontain reset circuitry 212 to discharge any accumulated charge on thevariable capacitor. The reset circuitry may be effectuated using manualswitches or controlled by external electronic signals. One having skillin the art will recognize that there are many different designs formeasuring capacitance and charge affects on variable capacitors.

Cyclone

FIG. 3 shows certain elements that may form some embodiments of acharged particle detector. Certain embodiments may have a device forseparating sampled aerosol particles based on characteristics such asaerodynamics, electrical mobility, or other characteristic size. FIG. 3Adepicts a cyclone. The cyclone accelerates particles within the InletFlow 310 through an inlet jet to create a spiraling airflow within theconical body. Particles with a certain minimum Stokes number havesufficient inertia to cross the streamlines and deposit on the wall orcollection cup 314 at the bottom of the body. In operation, smallerparticles exit through the top of the cyclone as an exit flow 312. Thecyclone has the effect of removing particles larger than a so-called‘cut size’ from the flow. The particle cut size may be defined as theparticle size (D50) where 50% of the particles pass into the outlet flow312 and the remaining 50% are deposited within the collection cup 314.The cut size is conventionally defined by the geometry of the cycloneand the particle Stokes number.

When particle inertial forces dominate the viscous forces exerted on theparticle by the airflow, particles do not follow the air streamlines anddeposit to the inside of the cyclone. Cyclones are less susceptible toclogging as compared to conventional round jet impactors, however, insome embodiments a round jet impactor may be employed to remove largeparticles. Alternative embodiments may be effectuated without apre-impactor.

Charger

FIG. 3B illustrates the cross-section of a charger used to ionizeincoming particles to charged gas molecules in a reproducible manner. Insome embodiments negatively charged ions are effectuated because thecharging efficiency for this polarity is slightly higher than that forpositive ions.

Some embodiments may employ a carefully controlled corona source 316 togenerate ions. Some embodiments may employ radioactive materials, forexample and without limitation, Polonium-210, Krypton-85 orAmericium-241, as ion sources 316. Corona ion sources may be carefullyisolated from the particles due to high electrostatic particle lossesand irreproducible charging characteristics in the corona region.

In some embodiments a microplasma may be employed as the ion source tocharge nanoparticles. Microplasmas are plasmas of small dimensions whichcan be generated at a variety of temperatures and pressures.Conventionally, microplasmas may exist as either thermal or non-thermalplasmas. Non-thermal microplasmas that can maintain their state atstandard temperatures and pressures can be relatively easily sustainedand manipulated under standard conditions. Microplasmas may beeffectuated using electrodes to create cathode discharges. The placementof the electrodes as well as the pressure determine the glow dischargeof the microplasma. In addition, certain embodiments may includedielectrics to create dielectric barrier discharge microplasmas. Themicroplasmas may be excited by RF, AC or DC power sources. Certainembodiments may also include laser sources for generating microplasmas.

Microplasma may employ a very low electric field strength outside the0.125 mm³ plasma volume (0.5 mm cube), thus providing significantlyhigher ion source flux from the plasma compared to other methods and therelatively low energy of the ions produced may lead to greaterreproducibility in charging. Moreover the fluid flow interactionsbetween the particle-laden flow and the plasma may be much bettercontrolled compared to corona techniques. Using a microplasma mayinclude a small flow (0.3 lpm) of Helium or other appropriate harvestgas passing through the plasma to harvest ions and to keep air fromextinguishing the plasma. The particle sample flow may be introducedthrough two small jets perpendicular to the ion-laden flow so mixingpromotes interaction between the flows in a well defined volume. A smallDC electric field may be applied to the combined exit flow to remove anyremaining unattached ions that could alter the particle charge statedownstream of the primary charging volume.

Photoionization

In some embodiments photoionization may be employed to chargenanoparticles. Photoionization is the ionization process in which an ionis formed from the interaction of a photon with an atom or molecule.This interaction results in the dissociation of that matter intoelectrically charged particles. The simplest example, the photoelectriceffect, occurs when light shines on a sample causing the ejection ofelectrons. The radiant energy may be infrared, visible, ultravioletlight, X rays, or gamma rays. The material may be a solid, liquid, orgas which when excited releases ions. Certain embodiments may employmulti-photon ionization (MPI), in which several photons of energy belowthe ionization threshold may actually combine their energies to ionizean atom.

The excitation of electrons in atoms and molecules by the absorption ofone or more photons may be sufficient for the spatial separation of theelectron and the atom or molecule. The combined energy of the absorbedphotons in this process must be above the ionization potential of theatom or molecule.

For photoionization an ultraviolet (UV) lamp or laser may be disposed toilluminate the nanoparticles in the charger. In some embodiments, alight source may be disposed to radiate through an optically transparentlens into the charger for FIG. 3B. The lens is disposed to irradiateflows passing through the charger. Upon ionization, techniques describedherein (infra) may be employed to effectuate control and measurement ofthe ionized particles.

The light sources may have power densities which allow photon ionizationvia stable electronic states of the molecule or atom. The required powerdensity has to be sufficiently high, so that one or more photons areabsorbed thus forming a radical cation.

Often molecules have ionization potentials smaller than 10 eV. Thuslight with a photon energy of around 5 eV which corresponds to awavelength of about 250 nm, which is in the ultraviolet (UV) part of theelectromagnetic spectrum may be employed. Accordingly laser systems maybe Krypton fluoride laser (wavelength (λ)=248 nm) and frequencyquadrupled Nd:YAG laser (wavelength (λ)=266 nm), fluorescent lamps andboth diode and gas lasers. The implementation of the laser source mayinclude a lens to distribute the light across a target area.

Ion Control

In FIG. 3B wire mesh electrodes 318 and 320 are stimulated withalternating DC electric fields to ‘trap’ particles within the centerwire mesh electrode 320 so they are not lost to any surface inside thecharger. For example and without limitation, a square wave such asvoltages on 318 and 320 (shown) may be applied (out of phase) withvoltage amplitudes between 0 and 400 volts (for 318) and 0 and 1000volts (for 320) having the effect of driving negative ions into theparticle flow region. In operation a charged particle traveling from theinlet to the outlet will be attracted to one or the other of the chargessurfaces or ground. Before the desired charged particle reaches asurface (or ground), the polarity of the charge on wire mesh 318 isreversed, driving the charged particle away from the surface where itwould have collided. By varying the applied voltage a predetermined massof charged particle may be guided from the inlet to the outlet withoutcolliding with any surface. Other, undesired, particles may be driven(or allowed) to deposit on to the side walls.

Certain embodiments may also employ filtered sheath air to physicallycontain the particles within the center wire mesh region.

One having skill in the art will recognize that the design of thecharger described herein minimizes the presence of multiply chargedparticles so that the primary responsibility of the impactor is toprevent build up of particulate matter inside the device. This may relaxthe cut size requirement so that a cut size of 300 nm, instead of 100nm, will suffice for certain operations. For example and withoutlimitation a 3.5 lpm air sample flow rate through the impactor, a 0.76mm inside diameter jet will provide a cut size of approximately 300 nmwith a pressure drop of about 0.2 atm.

FIG. 4 illustrates one embodiment of a system for particle number sizedistribution measurement 400. In FIG. 4 a cyclone 410 operates toreceive an airflow. The cyclone 410 only passes particles smaller than apredetermined “cut size” for the cyclone selected. Once through thecyclone 410, the preselected particles are fed to a unipolar charger 412for charging the particles. Now charged, the particles are applied to asizing spectrometer 414. Before applying the airflow to a spectrometer414, the airflow stream is split into two streams, a sheath flow 417 anda sample flow 419. In some embodiments, the split ratio is controlled tooptimize the resolution of a downstream spectrometer. Once split, thesheath flow is filtered (413) to remove any particles.

Spectrometer

In some embodiments a differential mobility analyzer (DMA) typespectrometer 414 design may be employed to effectuate particle sizeselection. Particle size selection may be effectuated with applied highvoltages that vary exponentially with time, or with high voltages variedwith time in other manners, or with high voltages that are held constantwith time.

In the embodiment shown, the DMA 414 may use a concentric cylindergeometry wherein the particle sample flow and filtered sheath flow passthrough the annular volume between the two cylinders. In certainembodiments different DMA 414 geometry, including radial, parallel platesome heretofore unknown geometry, may be used to effectuate particlesize selection. The inventors contemplate introducing the sheath andsample flows in laminar fashion to stop any fluidic mixing between thetwo streams. For example and without limitation, the sample flow 419 maybe introduced along the inside diameter surface of an outer tube whilethe sheath flow 417 is introduced along the outside diameter of theinner tube. Separation may then be effectuated by applying an electricfield between the inner and outer tubes and using the balance betweenthe electric field force and viscous drag force applied to the particlesto select for desired particles.

In the embodiment shown, the inside cylinder is electrically isolatedfrom the outer cylinder and a high voltage is scanned over time using avariable high voltage supply 415 to draw charged particles toward thecenter cylinder surface. Small slits in the center cylinder may allowfor a portion of the sheath flow to be withdrawn containing thesize-selected particles.

For the spectrometer 414 size selection may be a function of geometry.For example and without limitation, the inventors have found that acenter cylinder having an outside diameter of approximately 9.5 mm and aouter cylinder inside diameter of approximately 12.7 mm, about 1,074volts are required to size select 100 nm diameter particles for acylinder length of 51 mm. The cylinder length is the distance from thepoint where particles enter the spectrometer to the exit slits in thecenter cylinder. The above example may be effectuated under STPconditions for a filtered sheath airflow 417 of about 2 lpm and a sampleflow 419 of approximately 0.36 lpm. One having skill in the art willrecognize that selection of different size particles may be effectuatedby varying the geometry and voltage.

In the embodiment of FIG. 4, flow is maintained by conventionalminiature air flow pumps 422 and flow measurements are effectuated usingconventional flow measurement equipment 424.

Some embodiments may select for size using a parallel plate design withthe two electrode plates separated by insulating walls. In thisembodiment one electrode plate is held at ground potential while thevoltage of the other is scanned over time to draw oppositely chargedparticles toward it so they exit through small slits. Once the chargedparticles are selected, they pass to a porous charge collector 416. Inanother embodiment the voltage may be fixed and multiple chargecollectors positioned within the device to detect different sizedparticles simultaneously.

Charge Collector

The charge collector 416 may be effectuated as a porous, electricallyisolated metal frit electrically coupled to a MEMS electrometer 418through a metal wire. One having skill in the art will appreciate thatsystemic noise may reduce performance. Accordingly shielding of thecharge collector and electrometer may be critical for optimalperformance. The charge collector 416 may be formed of sintered metalpowder. Metal sintering may be effectuated using pure metals in a vacuumenvironment to reduce surface contamination. In some embodimentssintering under atmospheric pressure may be employed using a protectivegas. The charge is sensed on the charge collector 416 and coupled to aMEMS electrometer 418 as described herein.

In some embodiments a collector may be formed from a 10 mm diameter, 2mm thick disk of porous stainless steel pressed into a tube of Delrininsulator. A 1 mm diameter stainless steel wire may be inserted into theporous disk through the insulator to allow a shielded cable to beattached and supply the current signal to the electrometer 418.

Certain embodiments may employ differing control electronics 420including but not limited to processor-based controllers and sensors forcontrolling the applied voltages, directing the associated airflows, andmeasuring the sample and excess output flows. Moreover, operation of theMEMS electrometer 418 may include low noise drive and sense circuitrywhich may be coupled to the processor-based controller. In addition aMEMS electrometer is shown, but certain embodiments may be effectuatedusing different electrometers. For example and without limitation toprovide for harsher collection environments or to provide moreportability of a device.

UV Charger

FIG. 5 illustrates a representation of an ultra-violet ionizer 500. InFIG. 5 a metallic chamber 510 which may be formed from stainless steel,graphite, metallic coating, or some other material likely to contributeions to the process from UV excitation applied to the chamber wall.Attached to the chamber 510 is an ultra-violet energy source 512, suchas a UV lamp. The UV energy source 512 is coupled to a shutter mechanism516 such that UV radiation from the UV light source is directed towardsthe shutter mechanism 516. The shutter mechanism 516 is coupled to a UVtransparent window 514 which, in turn, is disposed on a surface openinginto the chamber 510.

The shutter mechanism 516 may include a variable adjustable opticaldiaphragm operable to fully block any UV radiation from the UV lightsource 512 from entering into the chamber 510, or to allow maximumpassage of UV light into the chamber 510. The shutter mechanism 516 iscontrolled by a shutter controller 518 which provides for operation ofthe optical diaphragm. In some embodiments the optical diaphragm may beelectronically actuated using motors, solenoids and the like.Conventional optical controllers such as those found in commercialcameras may also be employed. In some embodiments the shutter controller518 may be coupled to a processor (not shown), either directly orthrough a network. In some embodiments a shutter may not be necessary.

In operation, a user selects the desired wavelength for the UV source512. In some embodiments, a filter may be included to limit the spectrumof UV energy entering the chamber 510. Once selected, the shutter may beadjusted to maximize the charging efficiency of the UV charger 500.Maximum efficiency may be reached when the system exhibitscharged-particle equilibrium. Conventional processor instructions may bedesigned to dynamically control operation of the shutter and thus allowfor rapid responses to differing samples.

In some embodiments employing a UV-based design may include an inlettube for the particle sample flow, a chamber with the UV source, and anoutlet tube for the particle sample flow (e.g. no other flow isinvolved). In this embodiment, the UV generates ions that interact withthe particles creating the desired charge state before they leavethrough the outlet tube for further processing. Accordingly, in thisembodiment a harvest gas may not be required.

Certain embodiments may further employ dynamic charging by varying theoptical diaphragm in response to an anticipated particle. For exampleand without limitation, an airflow may initially be expected to containa first particle, or category of particles, and the charger adjusted tomaximize charging for that particle. Upon detection of the anticipatedparticle, the charger may be optimized for another particle.Accordingly, control of the other systems in the spectrometer may alsobe adjusted along with the charger.

The above illustration provides many different embodiments orembodiments for implementing different features of the invention.Specific embodiments of components and processes are described to helpclarify the invention. These are, of course, merely embodiments and arenot intended to limit the invention from that described in the claims.Moreover the attached appendix, which is incorporated herein byreference, includes alternative embodiments.

Although the invention is illustrated and described herein as embodiedin one or more specific examples, it is nevertheless not intended to belimited to the details shown, since various modifications and structuralchanges may be made therein without departing from the spirit of theinvention and within the scope and range of equivalents of the claims.Accordingly, it is appropriate that the appended claims be construedbroadly and in a manner consistent with the scope of the invention, asset forth in the following claims.

What is claimed:
 1. A system comprising: an ion production chamber; anultra-violet energy source disposed to provide ionizing energy to thechamber; an electric field disposed about the chamber outlet, and a jet,said jet operable to introduce a sample into the ion production chamber.2. The system of claim 1 further including: a harvest gas, said harvestgas being either helium, air or a combination thereof.
 3. The system ofclaim 2 wherein the sample is introduced perpendicular to the harvestgas flow.
 4. The system of claim 1 wherein the UV energy source isdisposed to the chamber through a UV transparent window.
 5. The systemof claim 1 wherein the UV energy source is a UV lamp.
 6. The system ofclaim 1 further including: a diaphragm operate to control the UV energyentering the chamber.
 7. The system of claim 6 further including: aprocessor, said processor coupled to a diaphragm controller, and amemory, said memory including processor readable instructions foroperating the diaphragm.
 8. The system of claim 1 further including: ametal electrode, said electrode coupled to an electrometer, whereinionized sample is coupled from the ion chamber to the electrometer. 9.The system of claim 8 wherein the electrometer includes a comb-driveactuator.
 10. A method comprising: directing UV radiation through avariable aperture diaphragm into a chamber; injecting a sample into thechamber; flowing the sample through the UV radiation, wherein particlesin the sample are ionized, and directing at least a portion of theionized particles to an electrometer.
 11. The method of claim 10 whereinthe UV radiation is directed through a UV transparent window.
 12. Themethod of claim 10 wherein the electrometer includes a comb-driveactuator.
 13. The method of claim 10 further including: applying anelectric field to a portion of the ionized particles.
 14. The method ofclaim 8 further including: injecting a harvest gas into the chamber. 15.The method of claim 10 further including: applying the ionized particlesto a metal charge collector, and coupling the charge collector to theelectrometer.
 16. A device comprising: a charger for ionizing aerosols,said charger including a UV light source; a porous metal chargecollector coupled to the charger, and an electrometer coupled to thecharge collector, said electrometer including a comb drive actuator. 17.The system of claim 16 wherein the electrometer includes a movingshuttle supported on flexures.
 18. The system of claim 16 furtherincluding an adjustable diaphragm disposed between the UV light sourceand the charger.